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Beamlines Activity ->Indus-2 Beamlines

  • X-ray fluorescence microprobe beamline

The physics design of the beamline is over. Ray tracing and heat load calculations have been performed.

This beamline has been designed with our aim to do normal XRF and micro mapping of sample. The following are the photon beam parameters on the sample. The beamline has energy range 4-20 keV. The energy resolution expected is 10,000. The beam size at the sample is 4microns X 8microns. Photon flux at the target is expected to be in the range 107-108 photons/sec. Optical layout is shown in figure 6.
 


                  

Figure 6: Optical Layout of X-Ray Fluorescence Beamline

 

This beamline can also be operated in various modes like focused (microprobe) , high energy resolution probe, normal XRF mode and TRXRF mode.

 

  • Soft and Deep X-ray Lithography (SDXRL) Beamline on Indus-2

Detail optical design of soft and deep X-ray lithography beamline on Indus-2 has been carried out . Optical layout of the SDXRL beamline is shown in Figure 7. The beamline optical elements consist of a plane mirror and a torroidal mirror. The angle of incidence on these mirrors in combination with the filters defines the energy window. The horizontal and vertical acceptances of the beamline are 5 mrad and 1 mrad respectively. Beamline performance is optimized on the following parameters; runout error (< ± 2.1 mrad), penumbral blur (< ± 0.8 mrad), power delivered at wafer location, beam size at sample/mask (55 (H) x 2 (V) mm2) and horizontal intensity uniformity (< ±3%). The beamline can also operate in no optics mode, with mirrors moved out of the beam path.

Aerial image formed at mask-wafer stage, by the beamline configuration (with mirror(s) angle q1 = 1.70 and q2 = 1.750) is shown in Figure 8. Beam size is enlarged at mask-wafer stage by scanning X-ray stepper/scanner in vertical direction. Considering beamline acceptance and performance, mirror sizes are limited to 100 mm (width) and 750mm (length). Surface roughness values of 3Å, 5Å  and 10Å  for mirrors are used to study its effect on image at the mask-wafer stage.  Effect of slope errors (0 to 271mrad) in meridional plane, on beam  image is simulated. Torroidal mirror misalignments (0-1000 mm in translation and 0 to 207 seconds in rotation) and their effects

 on beam shape and size are simulated.

 

Figure 7: Optical design of SDXRL beamline on Indus-2

 



Figure 8: Spot diagram of beam image at mask wafer stage grazing incidence
angles of plane mirror (
q1 = 1.70) and torroidal mirror (q2 = 1.750).

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